Planar Alloy Sputtering Target
Planar Alloy Sputtering Target
Product Description
Planar Alloy Sputtering Target
Excellent properties such as high purity, high density, Good composition uniformity, Uniform grain, etc.
High purity: The metal target requires very high purity, to ensure the stability and reliability of the material.We have various purity levels to suit your specific requirements, with the minimum purity of 99.5% up to 99.9999% for some metals. Also have controlled specific impurities within the target
High density: Metal targets have high density characteristics, usually up to 99%, to ensure the stability and quality of materials.
Uniform grain: Controlled grain size and direction
Good composition uniformity: the component distribution is uniform, ensure the film formation rate is uniform, film quality.
* Maximum sizes of planar target
Thickness: 30mm (can be 60mm for round target)
Width: max 2000mm
Length: max 4000mm
* Maximum sizes of rotary target
Vacuum/Air Spraying
Backing tubes: ID56 x OD64 x Length300~3000mm, Thickness: 3~5mm
Backing tubes: ID78~83 x OD89~92 x Length300~3000mm, Thickness: 3~7mm
Backing tubes: ID100 x OD108 x Length300~3000mm, Thickness: 3~8mm
Backing tubes: ID125 x OD133 x Length300~4000mm, Thickness: 3~13mm
Bonding
Backing tubes: ID125 x OD133 x Length500~4000mm, Thickness: 8~13mm
* Planar/Rotary target can be customised as per your request.
|
Chemical Formula |
Purity |
Forms |
Specification |
|
Si+Al |
99.9% / 99.99% |
Planar / Rotary |
Customized |
|
Ni+Cr |
99.8% / 99.99% |
Planar |
Customized |
|
Ti+Al |
99.6% / 99.9% |
Planar |
Customized |
|
Al+Sc |
99.99% |
Planar |
Customized |
|
In+Sn |
99.99% |
Planar |
Customized |
|
Al Alloy |
99.99% / 99.999% / 99.9995% |
Planar |
Customized |
|
Ag Alloy |
99.99% / 99.995% |
Planar |
Customized |
|
Au Alloy |
99.99% / 99.999% |
Planar |
Customized |
|
Cu Alloy |
99.99% / 99.999% |
Planar |
Customized |
|
Mo Alloy |
99.95% |
Planar |
Customized |
|
Ni Alloy |
99.99% |
Planar |
Customized |
|
Si Alloy |
99.99% |
Planar / Rotary |
Customized |
Alloy sputtering targets play a crucial role in thin film deposition processes, enabling the fabrication of coatings with specific properties tailored to the requirements of diverse applications in industries such as electronics, optics, and coatings.If you need any information or a quote please contact us, you can contact our sales team directly or fill out the form below and we will get back to you in time.
