Germanium Sputtering Target, Ge

Germanium sputtering target is composed of high purity Germanium metal.  Germanium is a chemical element originated from Germany (with the Latin name Germania). It was first mentioned in 1886 and observed by A. Winkler. “Ge” is the canonical chemical symbol of germanium. Its atomic number in the periodic table of elements is 32 with location at Period 4 and Group 14, belonging to the p-block. The relative atomic mass of germanium is 72.64(1) Dalton, the number in the brackets indicating the uncertainty.

Like silicon, germanium is a semiconductor and frequently utilized in the fabrication of transistors and integrated circuits. It is often evaporated under vacuum to create layers in the production of optical storage media and optical coatings. Other uses of the material are as an alloying agent and catalyst.

Applications:

Germanium Sputtering Target is mainly used in the electronics and information industry, glass coating field, wear-resistant materials, high-temperature corrosion resistance, high-grade decorative goods, and other industries.